| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology for reducing failure that occurs when an original plate or substrate is exposed with it being tilted from an image plane of a projection optical system. <P>SOLUTION: A scanning exposure device 50 includes a lighting optical system IL which illuminates an original plate 17 and a projection optical system PO which projects the pattern of original plate 17 onto a substrate 20. In such a state as the original plate 17 or substrate 20 is tilted from the image plane of the projection optical system PO, the original plate 17 is exposed while the original plate 17 and the substrate 20 are scanned. The scanning exposure device 50 includes a control part 30 which controls the projection optical system PO so that an aberration is generated according to the tilt of the original plate 17 or the substrate 20. <P>COPYRIGHT: (C)2009,JPO&INPIT |
