| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique preferred for controlling an exposure amount in a shot region with higher accuracy. <P>SOLUTION: A scanning exposure apparatus has a gravity center position adjusting unit 8. The gravity center position adjusting unit 8 is configured to project a pattern of an original plate to a substrate by a projection optical system with scanning the original plate and the substrate and to scan and expose the substrate, and adjusts a gravity center position in a scanning axis direction of slit-shaped exposure light incoming to an image surface of the projection optical system based on a target gravity center position. <P>COPYRIGHT: (C)2009,JPO&INPIT |
