A method, system and computer program product for rendering a mask are disclosed. A method of rendering a mask may comprise: providing an initial mask design for a photolithographic process, the initial mask design including polygons; initially rendering the initial mask design as a coarse mask representation in a pixel based image calculation; identifying an overhang portion; and rendering the overhang portion using a set of subpixels whose artifacts from spatial-localization lie outside a practical resolution of a pseudo lens having a numerical aperture larger than that of a projection lens used in the photolithographic process; and updating the initial rendering based on the overhang portion rendering.
申请公布号
WO2009091784(A1)
申请公布日期
2009.07.23
申请号
WO2009US30934
申请日期
2009.01.14
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION;LAVIN, MARK, A.;MUKHERJEE, MAHARAJ;ROSENBLUTH, ALAN, E.
发明人
LAVIN, MARK, A.;MUKHERJEE, MAHARAJ;ROSENBLUTH, ALAN, E.