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发明名称
Method for manufacturing semiconductor epitaxial crystal substrate
摘要
申请公布号
GB2456437(A)
申请公布日期
2009.07.22
申请号
GB20090006330
申请日期
2009.04.09
申请人
SUMITOMO CHEMICAL COMPANY, LIMITED
发明人
HIROYUKI SAZAWA;NAOHIRO NISHIKAWA;MASAHIKO HATA
分类号
H01L21/316;H01L21/338;H01L29/778;H01L29/78;H01L29/812
主分类号
H01L21/316
代理机构
代理人
主权项
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