发明名称 Maskless method of preparing metal contacts in a semiconductor substrate for bonding
摘要 <p>A method is disclosed for preparing metal contacts (30) in a semiconductor substrate (10), the method comprising obtaining the metal contacts to protrude from a surface of the semiconductor substrate, the semiconductor substrate having a passivation layer (40) over the surface and over the protruding metal contacts, and removing parts of the passivation layer to reveal the protruding metal contacts without requiring alignment of a patterned mask to the locations of the metal contacts.</p>
申请公布号 EP2081224(A1) 申请公布日期 2009.07.22
申请号 EP20080150918 申请日期 2008.01.31
申请人 IMEC 发明人 BEYNE, ERIC;SWINNEN, BART;RUYTHOOREN, WOUTER
分类号 H01L21/768 主分类号 H01L21/768
代理机构 代理人
主权项
地址