发明名称 |
Maskless method of preparing metal contacts in a semiconductor substrate for bonding |
摘要 |
<p>A method is disclosed for preparing metal contacts (30) in a semiconductor substrate (10), the method comprising obtaining the metal contacts to protrude from a surface of the semiconductor substrate, the semiconductor substrate having a passivation layer (40) over the surface and over the protruding metal contacts, and removing parts of the passivation layer to reveal the protruding metal contacts without requiring alignment of a patterned mask to the locations of the metal contacts.</p> |
申请公布号 |
EP2081224(A1) |
申请公布日期 |
2009.07.22 |
申请号 |
EP20080150918 |
申请日期 |
2008.01.31 |
申请人 |
IMEC |
发明人 |
BEYNE, ERIC;SWINNEN, BART;RUYTHOOREN, WOUTER |
分类号 |
H01L21/768 |
主分类号 |
H01L21/768 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|