发明名称 |
SOLUTION FOR TREATMENT OF RESIST SUBSTRATE AFTER DEVELOPMENT PROCESSING, AND METHOD FOR TREATMENT OF RESIST SUBSTRATE USING THE SAME |
摘要 |
Disclosed is a resist substrate treatment solution for improving defects on the surface of a pattern formed by a development processing. Also disclosed is a method for the treatment of a resist substrate using the resist substrate treatment solution. The resist substrate treatment solution comprises a nitrogen-containing water-soluble polymer or an oxygen-containing water-soluble polymer (e.g., a polyamine, a polyol, a polyether) and a solvent. The method comprises the steps of treating a resist pattern formed by a development processing with the resist substrate treatment solution and washing the resist pattern with pure water.
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申请公布号 |
KR20090079242(A) |
申请公布日期 |
2009.07.21 |
申请号 |
KR20097010135 |
申请日期 |
2007.10.12 |
申请人 |
AZ ELECTRONIC MATERIALS (JAPAN) K.K. |
发明人 |
NOYA GO;SHIMAZAKI RYUTA;KOBAYASHI MASAKAZU |
分类号 |
G03F7/32;H01L21/304 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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