发明名称 SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To solve a problem that an internal inductor of a semiconductor device is apt to malfunction or stop operating since an influence of lines of magnetic force that an inductor generates on the internal inductor is strong because of a short distance between the internal inductor and inductor. SOLUTION: The inductor 50 and internal inductor 12 are formed not superposing each other along the thickness of a silicon substrate 10. Consequently, the distance between the inductor 50 and internal inductor 12 when they do not superpose each other along the thickness of the silicon substrate 10 is longer than that when they superpose each other. Consequently, the influence of lines of magnetic force that the inductor 50 generates on the internal inductor 12 is reduced. Consequently, malfunction and operation stopping of the internal inductor 12 of the semiconductor device 1 can be reduced. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009081354(A) 申请公布日期 2009.04.16
申请号 JP20070250789 申请日期 2007.09.27
申请人 SEIKO EPSON CORP 发明人 TAKITA YUZO;KOBAYASHI TOMONAGA
分类号 H01L21/822;H01L27/04 主分类号 H01L21/822
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