化学放大正型抗蚀（光阻）组成物,申请号TW097117643-传众专利搜索

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发明名称	化学放大正型抗蚀（光阻）组成物
摘要	一种化学放大正型抗蚀(光阻)组成物，其包含：(A)树脂，其包含：(i)式(I)所示之聚合单位：#P 097117643P01.bmp(ii)式(II)所示之聚合单位：#P 097117643P02.bmp和(iii)至少一种选自式(III)所示之聚合单位：#P 097117643P03.bmp和式(IV)所示之聚合单位：#P 097117643P04.bmp所组成的群组中之聚合单位；及(B)至少一种酸产生剂。
申请公布号	TW200916961	申请公布日期	2009.04.16
申请号	TW097117643	申请日期	2008.05.14
申请人	住友化学股份有限公司	发明人	秋田诚;末次益实;桥本和彦
分类号	G03F7/039(2006.01);C08F212/14(2006.01);C08F220/12(2006.01);H01L21/027(2006.01)	主分类号	G03F7/039(2006.01)
代理机构		代理人	洪武雄;陈昭诚
主权项
地址	日本

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