| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an onium salt suitable for a radiation-sensitive acid generating agent, to provide a radiation-sensitive acid generating agent comprising the onium salt as an essential component, and to provide a positive-type radiation-sensitive resin composition containing the radiation-sensitive acid generating agent. <P>SOLUTION: The onium salt is represented by formula (5) (wherein, Ar<SP>3</SP>is a divalent aromatic hydrocarbon or the like; R<SP>5</SP>and R<SP>6</SP>are an alkyl group or the like; w is an integer of 1-10; y is an integer of 0-6; and v is an integer of 0-3), the radiation-sensitive acid generating agent comprising the onium salt as an essential component is provided, and the positive-type radiation-sensitive resin composition comprises the acid generating agent. <P>COPYRIGHT: (C)2009,JPO&INPIT |
