发明名称 PRODUCTION PROCESS OF FERROELECTRIC SUBSTANCE
摘要 PROBLEM TO BE SOLVED: To provide a production process of a ferroelectric thin film capable of reducing thermal load in crystallization of ferroelectric substances, a ferroelectric memory and its production method, a semiconductor device and its production method. SOLUTION: A production method of a ferroelectric thin film of this invention comprises a step of forming a fine crystalline core 40 of an oxide by irradiating laser pulses or light of a lamp on the amorphous oxide thin film 30 formed on the substrate 10 and a step of forming a ferroelectric substance 50 by irradiating laser pulses or light of lamp on the thin film including the fine crystalline core 40 to crystalize the oxide. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009081446(A) 申请公布日期 2009.04.16
申请号 JP20080282137 申请日期 2008.10.31
申请人 SEIKO EPSON CORP 发明人 SAWAZAKI TATSUO
分类号 H01L21/316;H01L21/8246;H01L27/105 主分类号 H01L21/316
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