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发明名称
用于清除微电子装置残余物之非含氟组合物
摘要
本发明系关于用于将残余物从其上具有该残余物之微电子装置清除之清洁组合物与方法。该大体上不含氟化物物质、胺物质及有机溶剂之组合物达成高效清洁微电子装置之包括蚀刻后残余物、灰化后残余物及/或化学机械抛光(CMP)后残余物之残余物材料而同时不损伤亦存在其上之层间介电与金属互连材料。
申请公布号
TW200916571
申请公布日期
2009.04.16
申请号
TW097129586
申请日期
2008.08.04
申请人
先进科技材料公司
发明人
麦可B 柯珊斯基;蒋平;布瑞特妮 瑟克
分类号
C11D3/33(2006.01);C11D3/36(2006.01);C11D3/20(2006.01);C23F11/00(2006.01);H01L21/306(2006.01)
主分类号
C11D3/33(2006.01)
代理机构
代理人
陈长文
主权项
地址
美国
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