| 摘要 |
<p>An exposure apparatus and a correction apparatus are provided to improve a throughput and a resolution by maintaining a high transmittance and a high polarization performance. An exposure apparatus(1) includes an illumination optical system(40) arranged inside a chamber(30), a projection optical system(60), a stage, and an optical axis correction part(100). A light source unit(10) is separated from the exposure apparatus. A pulling optical system(20) is contacted in the light source unit and the exposure apparatus, and includes a mirror(22) and a lens(24). The illumination optical system uniformly illuminates a reticle(50), and includes a polarization control part(42). The reticle is supported by a reticle stage. A diffraction light from the illuminated reticle passes the projection optical system, and is imaged on a top of a wafer(70). A pattern of the reticle is transferred on the wafer by relatively moving the reticle and the wafer. The projection optical system projects a phase of the pattern of the reticle on the wafer. The optical axis correction part includes a first lens(110), a second mirror(120), a second lens(130), and a first mirror(140).</p> |
