发明名称 Nozzle plate producing method
摘要 A method for producing a nozzle plate comprises a liquid-repellant coat removal step for conducting a plasma treatment to each chip from a same side as a liquid droplet ejecting surface under an atmospheric pressure, while supplying a gaseous mask material for protection of the liquid-repellant coat through nozzle holes from an opposite side of the liquid droplet ejecting surface in such a manner that the gaseous mask material is leaked out over the liquid droplet ejecting surface around the nozzle holes, to thereby remove the liquid-repellant coat exposed outside the mask material; and a bonding step for bonding each chip to the nozzle plate body at the area from which the liquid-repellant coat is removed by the liquid-repellant coat removal step.
申请公布号 US7516549(B2) 申请公布日期 2009.04.14
申请号 US20060326537 申请日期 2006.01.05
申请人 SEIKO EPSON CORPORATION 发明人 ASUKE SHINTARO
分类号 B21D53/76;C23F1/12 主分类号 B21D53/76
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