| 摘要 |
<P>PROBLEM TO BE SOLVED: To disclose and provide an apparatus that is equipped with a substrate table for supporting substrate. <P>SOLUTION: A supporting table includes a plurality of supporting protrusions, coming into contact with a substrate when used to support the substrate. This support table includes a plurality of heat transfer protrusions, extending toward the substrate without making contact with the substrate, when the substrate is supported by the supporting protrusions during use. A heat exchange gap, containing a gas for exchanging heat with the substrate, extends between the heat transfer protrusions and the substrate. <P>COPYRIGHT: (C)2009,JPO&INPIT |
