APPARATUS FOR TREATING SUBSTRATE

摘要

An apparatus for processing a substrate is provided to prevent damage to the substrate due to the contact between a processing solution supply unit and the substrate by sensing a moving path of the processing solution supply unit. A housing(110) provides a space cleansing a semiconductor substrate. The housing has a cylindrical shape with an open upper part. The semiconductor substrate is inserted into the housing through the upper part of the housing. A plurality of solution input ports(113) are formed in the housing. A plurality of solution output ports(115) are formed in the housing. A spin head(120) includes a plate(122) supporting the semiconductor substrate and a rotation axis to rotate the plate. A processing solution supply member supplies the processing solution to the semiconductor substrate.