发明名称 APPARATUS AND METHOD FOR CUTTING SUBSTRATE USING ULTRASHORT PULSED LASER BEAM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an apparatus and a method for cutting substrates using an ultrashort pulsed laser beam, which perform fast and high-accuracy cutting by a simple process regardless of kinds of glasses which are slightly different depending on uses and characteristics of displays. <P>SOLUTION: The substrate cutting apparatus using the ultrashort pulsed laser beam comprises a laser beam generating means which generates ultrashort pulsed laser beams and a focusing means which adjusts the focus of the ultrashort pulsed laser beam to the inside of the substrate to be cut. An internal filamentation phenomenon is induced by irradiation along a desired cutting path while the ultrashort pulsed laser beam is focused on the inside of the substrate, so that a cut groove is formed inside the substrate. This method enables substrates used for various types of displays to be cut quickly and accurately by the simple process without causing any crack or break. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009072829(A) 申请公布日期 2009.04.09
申请号 JP20080240447 申请日期 2008.09.19
申请人 ICU RESEARCH & INDUSTRIAL COOPERATION GROUP;CYBER LASER KK 发明人 LEE MAN SEOP;AHMED FARID;MIN CHUL KI
分类号 B23K26/38;B23K26/04;B23K26/08;B23K26/40;C03B33/09 主分类号 B23K26/38
代理机构 代理人
主权项
地址