APPARATUS FOR TRANSFERRING SUBSTRATE

摘要

An apparatus for transferring a substrate is provided to reduce movement distance by using a handler of a lower part and an upper part to transfer the substrate to each process chamber. A plurality of handler(121, 122) is separated from a main arm(110) by a certain distance. The distance between first handlers is controlled according to the size of the wafer. The handler is formed to support the first handler while being made of material having rigidity. A tube is formed inside the first hander, at least one grip units(131-134) is formed on the first handler. A seating unit(132b) of the first grip is adhered closely to the lower pat of the substrate. An inlet is arranged on the seating unit of the first grip, the tube is formed inside the first handler to supply an intake pressure. A fine adjustment is installed at the substrate.