发明名称 CONDUCTIVE SUBSTRATE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a conductive substrate capable of easily forming a metal film on a substrate without heating and performing optical treatment. SOLUTION: In the conductive substrate (a metal composite film) formed of the substrate and the metal film formed on the substrate, the substrate is to be a substrate having a porous layer (for example, a porous layer formed of inorganic particles such as silica) at least on the surface, dispersion liquid including metal colloid particles composed of metal nano-particles A and protective colloids B for coating the metal nano-particles A is coated on the porous layer to form the metal film, and thus, the metal composite film is manufactured. Low temperature sintering of the metal nano-particles can be produced on the conductive substrate by only applying the dispersion liquid. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009076455(A) 申请公布日期 2009.04.09
申请号 JP20080219932 申请日期 2008.08.28
申请人 MITSUBOSHI BELTING LTD 发明人 ISEDA TAISUKE;IKUTAKE NORIKO
分类号 H01B5/14;B32B15/08;H01B13/00 主分类号 H01B5/14
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