| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a method for processing a substrate which can efficiently collect a chemical liquid, without using a complicated mechanism. SOLUTION: In the substrate processing apparatus, a control part 121 controls chemical processing using a chemical liquid after rinse-processing using a rinse liquid. The chemical liquid is supplied on the substrate while the substrate W is rotated at the number of rotations higher than that for the rinse processing to clean a waste liquid cup with the chemical liquid. The liquid received by a waste liquid cup 51 is disposed through a disposal line 113. After that, the substrate is treated with the chemical liquid by supplying the chemical liquid on the substrate while the substrate is rotated at the number of rotations for the chemical processing. The liquid received by the waste liquid cup is collected through a collection line 112. COPYRIGHT: (C)2009,JPO&INPIT
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