发明名称 WAVEFRONT ABERRATION MEASURING DEVICE AND METHOD AND WAVEFRONT ABERRATION ADJUSTING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a wavefront aberration measuring device capable of measuring the wavefront aberration of an optical system under test by a relatively simple constitution without using an interferometry. SOLUTION: This wavefront aberration measuring device for measuring the wavefront aberration of the optical system under test 20 comprises a point source 3a:1-3 for supplying measurement light, a photodetector 7 having a detector plane disposed at a position optically conjugate to the point source, a wavefront change giving unit 5 that is disposed in an optical path between the point source and the photodetector and gives a change in wavefront to the light which has passed the optical system under test, and a measuring unit 6 for measuring the wavefront aberration of the optical system under test on the basis of the output of the photodetector and the change in wavefront given by the wavefront change giving unit. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009075090(A) 申请公布日期 2009.04.09
申请号 JP20080212434 申请日期 2008.08.21
申请人 NIKON CORP 发明人 NEGISHI TAKETOSHI
分类号 G01M11/02 主分类号 G01M11/02
代理机构 代理人
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