发明名称 METHOD AND APPARATUS FOR FORMING FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for forming a film wherein oxygen shortage scarcely occurs when an oxide film is formed by an ALD method. <P>SOLUTION: When a workpiece is inserted into a treatment container which can be held vacuum, the inside of the treatment container is held in a vacuum state, and the step of supplying film forming raw material therein (step S1) and the step of supplying oxidant therein (step S2) are repeated two or more times to form an oxide film on a substrate, the step of supplying oxidant (step S2) repeats the supply of the oxidant two or more times with the vacuum suction being interposed between the successive supplies. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009076542(A) 申请公布日期 2009.04.09
申请号 JP20070242046 申请日期 2007.09.19
申请人 TOKYO ELECTRON LTD 发明人 ISHIDA YOSHIHIRO
分类号 H01L21/316;C23C16/40;H01L21/205;H01L21/31 主分类号 H01L21/316
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