发明名称 CHEMICAL POLISHING FLUID FOR GLASS SUBSTRATE AND MANUFACTURING METHOD OF LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To solve the problems wherein the flaws or the like on a glass surface are enlarged and flatness is deteriorated in a chemical polishing step for reducing the thickness of a glass substrate for a liquid crystal display device. SOLUTION: The enlargement of the flaws is suppressed and the liquid crystal display element having an excellent display surface quality is efficiently manufactured at a low cost by polishing a glass substrate surface by a chemical polishing liquid containing at a ratio of≥25 wt.% mixture solution of hydrofluoric acid and ammonium fluoride and≤30 wt.% at least one kind acid solution among hydrochloric acid, sulfuric acid, phosphoric acid, nitric acid and acetic acid and using water as a solvent. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009073711(A) 申请公布日期 2009.04.09
申请号 JP20070246481 申请日期 2007.09.25
申请人 HITACHI DISPLAYS LTD 发明人 SATO HIDEMI;KIKUCHI HIROSHI;TAKAHARA YOICHI;SAEKI TOMONORI
分类号 C03C15/00;G02F1/13;G02F1/1333 主分类号 C03C15/00
代理机构 代理人
主权项
地址