| 摘要 |
PROBLEM TO BE SOLVED: To provide an active energy ray-curable resin composition with which a nano uneven structure having both high scratch resistance and good water repellency can be formed, the nano uneven structure produced using the same, its production method, and a water-repellent article provided with the nano uneven structure. SOLUTION: The active energy ray-curable resin composition contains polymerization-reactive monomer components including 60-97 pts.mass of a multifunctional monomer (A) having a surface free energy of 37 mJ/m<SP>2</SP>or more when cured and 3-29 pts.mass of a monomer (B) having a surface free energy of 30 mJ/m<SP>2</SP>or less when cured and 0.01-10 pts.mass of an active energy ray polymerization initiator (D) with respect to 100 pts.mass of the polymerization-reactive monomer components, wherein (A) has 3 or more radical-polymerizable functional groups within the molecule, in which the value obtained by dividing the molecular weight by the number of the radical polymerizable functional groups ranges from 110 to 200 and (B) has one or more radical polymerizable functional groups within the molecule. COPYRIGHT: (C)2011,JPO&INPIT |
