发明名称 METHOD OF PRODUCING SILICON SINGLE CRYSTAL, APPARATUS FOR PULLING SILICON SINGLE CRYSTAL, AND QUARTZ GLASS CRUCIBLE
摘要 PROBLEM TO BE SOLVED: To provide a method for monitoring leakage of silicon melt, and detecting touch of a seed crystal, and in addition, attaining reinforcement of a quartz glass crucible to be endurable during pulling for a long time, and decrease of impurity concentration of a silicon single crystal. SOLUTION: The method of producing a silicon single crystal includes: steps S13, S14 of detecting a touching status of a seed crystal at a silicon melt by supplying voltage V1 using a crucible side as a negative electrode and a wire side as a positive electrode and by monitoring changes of the voltage, when the seed crystal provided at a front end of the wire touches the silicon melt inside the quartz glass crucible; a step of devitrifying an inner surface of the quartz glass crucible as supplying a voltage V2 using the crucible side as a positive electrode and the wire side as a negative electrode during a temperature control period S15; and steps S16 to S22 of growing the silicon single crystal by slowly pulling the seed crystal as supplying a voltage V3 using the crucible side as a negative electrode and the wire side as a positive electrode after the temperature control period S15. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010275139(A) 申请公布日期 2010.12.09
申请号 JP20090128291 申请日期 2009.05.27
申请人 JAPAN SIPER QUARTS CORP;SUMCO CORP 发明人 FUKUI MASANORI;WATANABE HIDEKI;TAKASE NOBUMITSU
分类号 C30B29/06;C03B20/00;C30B15/00;C30B30/02 主分类号 C30B29/06
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