发明名称 |
ELECTRODE FOR ELECTROSTATIC ATTRACTION, MANUFACTURING METHOD THEREFOR AND SUBSTRATE PROCESSING APPARATUS |
摘要 |
PURPOSE: An electrostatic absorbing electrode, a method for manufacturing the same, and a substrate processing apparatus are provided to simply obtain both an insulating layer and an electrode layer by forming a first electrode layer and a second electrode layer through a spraying method. CONSTITUTION: A substrate supporting face absorbs a substrate(G) using electrostatic force. An insulating coating(41) is formed on a base through a spraying method. The positive voltage is applied to a first electrode layer(42a). A negative voltage is applied to a second electrode layer(42b). Both the first electrode layer and the second electrode layer are formed on the insulating coating.
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申请公布号 |
KR20100128229(A) |
申请公布日期 |
2010.12.07 |
申请号 |
KR20100032292 |
申请日期 |
2010.04.08 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SASAKI YOSHIHIKO;MINAMI MASATO;FURUYA ATSUKI |
分类号 |
H01L21/687;B23Q3/15;H01L21/205;H02N13/00 |
主分类号 |
H01L21/687 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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