发明名称 ELECTRODE FOR ELECTROSTATIC ATTRACTION, MANUFACTURING METHOD THEREFOR AND SUBSTRATE PROCESSING APPARATUS
摘要 PURPOSE: An electrostatic absorbing electrode, a method for manufacturing the same, and a substrate processing apparatus are provided to simply obtain both an insulating layer and an electrode layer by forming a first electrode layer and a second electrode layer through a spraying method. CONSTITUTION: A substrate supporting face absorbs a substrate(G) using electrostatic force. An insulating coating(41) is formed on a base through a spraying method. The positive voltage is applied to a first electrode layer(42a). A negative voltage is applied to a second electrode layer(42b). Both the first electrode layer and the second electrode layer are formed on the insulating coating.
申请公布号 KR20100128229(A) 申请公布日期 2010.12.07
申请号 KR20100032292 申请日期 2010.04.08
申请人 TOKYO ELECTRON LIMITED 发明人 SASAKI YOSHIHIKO;MINAMI MASATO;FURUYA ATSUKI
分类号 H01L21/687;B23Q3/15;H01L21/205;H02N13/00 主分类号 H01L21/687
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