CLEANING SHEET, TRANSFER MEMBER PROVIDED WITH CLEANING FUNCTION, AND METHOD FOR CLEANING SUBSTRATE PROCESSING APPARATUS

摘要

There are provided a transfer member provided with a cleaning function, which have excellent foreign matter removing performance and transfer performance, and which can remove foreign matters having a predetermined particle diameter with especially high efficiency. The transfer member provided with a cleaning function includes a transfer member and the cleaning layer provided on at least one surface of the transfer member. The cleaning layer has a microasperity shape having an arithmetic average roughness Ra of 0. 05 µm or less and a maximum height Rz of 1. 0 µm or less. Preferably, a substantial surface area of the cleaning layer per a flat surface of 1 mm 2 is 150% or more of a substantial surface area of a silicon wafer mirror surface per a flat area of 1 mm 2 .