| 摘要 |
PURPOSE: An alkali soluble resin, a producing method thereof, and a photoresist resin composition material using thereof are provided to secure the high solubility for an alkaline developer, and to perform a proper photo-curing process for the irradiation of ultraviolet rays or electronic beams. CONSTITUTION: An alkali soluble resin is marked with chemical formula 1, and includes a polymerizable unsaturated group and a carboxyl group inside the molecule. In the chemical formula 1, W is a bisphenol derivative marked with chemical formula 2. Y is a tetravalent carboxyclic acid moiety. In the chemical formula 2, R1~R4 are a hydrogen atom, an alkyl group with 1~6 carbons, a halogen atom, or a phenyl group, respectively. |
