RESIN FOR RESIST, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN,申请号KR20087018857-传众专利搜索

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发明名称	RESIN FOR RESIST, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
摘要
申请公布号	KR100985431(B1)	申请公布日期	2010.10.05
申请号	KR20087018857	申请日期	2004.08.10
申请人		发明人
分类号	G03F7/039;C08F220/18;C08F220/28;G03F7/004;H01L21/30	主分类号	G03F7/039
代理机构		代理人
主权项
地址

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