| 摘要 |
An ellipsometer is used to analyze each of a plurality of sample portions that each include a substrate portion with a coating portion thereon, the substrate portions corresponding to respective spaced portions of a part with a curved surface. For each sample portion, the analysis includes: directing onto the coating portion a beam of radiation that includes first and second components with different polarizations; detecting energy of each of the first and second components reflected by the sample portion; and generating data that includes, for each of a plurality of different wavelengths, information regarding a change caused by the sample portion to a relationship between the first and second components.
|
