发明名称 |
Semiconductor device comprising MIM capacitor |
摘要 |
A conductive film embedded in a predetermined region on an upper surface of an insulation film and metallic wirings embedded so as to penetrate through the conductive film and protrudes into the insulation film constitute a lower electrode of an MIM capacitor.
|
申请公布号 |
US7800112(B2) |
申请公布日期 |
2010.09.21 |
申请号 |
US20080257700 |
申请日期 |
2008.10.24 |
申请人 |
PANASONIC CORPORATION |
发明人 |
OOTANI ITARU;HAYASHI SHINICHIRO;NISHIURA SHINJI |
分类号 |
H01L27/108 |
主分类号 |
H01L27/108 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|