| 发明名称 |
STAGE APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate stage for performing highly accurate positioning, capable of suppressing swing in a pitching direction of an XY stage. <P>SOLUTION: A stage apparatus includes: a stage; a first driving mechanism for driving the stage in a first direction; a second driving mechanism for driving the stage in a second direction perpendicular to the first direction; a drive guide for guiding the drive of the stage in the second direction by the second driving mechanism; and an air bearing arranged facing the drive guide to support the stage. The second driving mechanism further includes a means for driving the stage in the first direction and a control means which, when driving the stage by the first driving mechanism, controls an interval between the drive guide and the air bearing by driving the second driving mechanism. <P>COPYRIGHT: (C)2011,JPO&INPIT |
| 申请公布号 |
JP2010251622(A) |
申请公布日期 |
2010.11.04 |
| 申请号 |
JP20090101475 |
申请日期 |
2009.04.17 |
| 申请人 |
CANON INC |
发明人 |
HIRUMA KENTARO;SHIDA TOSHIAKI |
| 分类号 |
H01L21/027;G03F7/20;H01L21/68 |
主分类号 |
H01L21/027 |
| 代理机构 |
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