SURFACE PROCESSING MASK AND METHOD FOR MANUFACTURING THE SAME, SURFACE PROCESSING METHOD, AND PARTICLE-CONTAINING FILM AND METHOD FOR MANUFACTURING THE SAME

摘要

This invention provides a surface processing mask having a film mask and a method for manufacturing the same. In the film mask, particles are present as a single layer without overlapping with each other or particles containing first particles and second particles having etching resistance lower than that of the first particles are contained. Moreover, the invention provides a surface processing method including disposing the film mask on the front surface of a process target, and etching the front surface to form irregularities and an optical device having a substrate processed by the surface processing method. Moreover, the invention provides a particle-containing film in which particles are arranged to form a single layer without overlapping with each other and a method for manufacturing the same.