| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming microstructures formable of the microstructure such as a micro-pore and a micro-groove at a substantially constant etching speed, without affected by arrangement in a substrate, a laser irradiation device used in the forming method, and the substrate produced using the forming method. <P>SOLUTION: This method for forming the microstructure includes a process A of irradiating an area provided with the pore-like microstructure in the substrate 1, with a laser beam 51 having a pulse duration of picosecond order or less in a pulse time width, and scanning a focal point 56 converged with the laser beam 51, to form a modified part 53, and a process B of etching the substrate formed with the modified part 53, and for removing the modified part 53, to form the microstructure, and is constituted to emit the laser light, while maintaining a direction P of a linear polarization, in a fixed direction with respect to a direction of scanning the focal point 56, using the linearly polarized laser light as the laser light 51. in the process A. <P>COPYRIGHT: (C)2012,JPO&INPIT |
