| 摘要 |
PURPOSE: A linear sputtering reactor is provided to efficiently execute sputtering by revering the phase of frequency and supplying to a target and to uniformly evaporate a large size substrate by spraying an ion which is sputtered as a linear type. CONSTITUTION: An opening is included in the lower side of a discharge tube body(30) in order to discharge an ion which is sputtered. Target electrodes(31-1,31-2) are installed in the inner side of the discharge tube body. The target electrode executes a function of a source target and a function of a capacity connective electrode. A power supply source(1) supplies power to the target electrode. A gas supply part is included in the upper side of a sputtering reactor and comprises a plurality of gas spraying holes for supplying gas which is provided in a gas entrance to the inside of the discharge tube body.
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