发明名称 |
VACUUM PROCESSING APPARATUS |
摘要 |
<p>PURPOSE: A vacuum processing device is provided to improve process efficiency by shortening time required for the return of a wafer. CONSTITUTION: A standby block(101) comprises a box body(106) equipped with standby transfer vehicle(110). A plurality of cassette platforms(107) is installed at the front side of the box body. A vacuum block(102) comprises a first vacuum transfer chamber(104), a second vacuum transfer chamber(111), and a lock chamber(105). The first vacuum transfer chamber and the second vacuum transfer chamber comprise a vacuum container formed into a rectangular shape. A wafer supporting unit comprises a first vacuum transfer robot and a second vacuum transfer robot.</p> |
申请公布号 |
KR20120075313(A) |
申请公布日期 |
2012.07.06 |
申请号 |
KR20110011081 |
申请日期 |
2011.02.08 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
ISOMURA RYOICHI;TAUCHI SUSUMU;KONDO HIDEAKI |
分类号 |
H01L21/677;H01L21/67;H01L21/68 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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