发明名称 VACUUM PROCESSING APPARATUS
摘要 <p>PURPOSE: A vacuum processing device is provided to improve process efficiency by shortening time required for the return of a wafer. CONSTITUTION: A standby block(101) comprises a box body(106) equipped with standby transfer vehicle(110). A plurality of cassette platforms(107) is installed at the front side of the box body. A vacuum block(102) comprises a first vacuum transfer chamber(104), a second vacuum transfer chamber(111), and a lock chamber(105). The first vacuum transfer chamber and the second vacuum transfer chamber comprise a vacuum container formed into a rectangular shape. A wafer supporting unit comprises a first vacuum transfer robot and a second vacuum transfer robot.</p>
申请公布号 KR20120075313(A) 申请公布日期 2012.07.06
申请号 KR20110011081 申请日期 2011.02.08
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 ISOMURA RYOICHI;TAUCHI SUSUMU;KONDO HIDEAKI
分类号 H01L21/677;H01L21/67;H01L21/68 主分类号 H01L21/677
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