| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of determining the thickness of one or more layers in a single or multi-layer structure on a substrate, using photoelectron spectroscopy. <P>SOLUTION: The thickness may be determined by measuring the intensities of two photoelectron species or other atom-specific characteristic electron species emitted by the structure when bombarded with photons. A predictive intensity function that is dependent on the thickness or a layer is determined for each of the photoelectron species. A ratio of two predictive intensity function is formulated, and the ratio is iterated to determine the thickness of a layer of the structure. According to one embodiment, two photoelectron species may be measured from a single layer to determine a thickness of that layer. According to another embodiment, two photoelectron species from different layers or from a substrate may be measured to determine a thickness of a layer. <P>COPYRIGHT: (C)2012,JPO&INPIT |
