发明名称 TWO-STAGE LASER DEVICE AND ADJUSTMENT METHOD APPLIED TO TWO-STAGE LASER DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain higher laser output stability and higher laser output of a two-stage laser device by reducing variance in laser output.SOLUTION: A beam profiler 401 measures a sectional profile of a laser beam discharge-excited by an oscillation stage laser device 100 and a sectional profile of a laser beam discharge-excited by an amplification stage laser device 200. Adjustment means 300 (a rotating mechanism for plano-convex cylindrical lens and plano-convex cylindrical lens) makes an adjustment to rotate a section of the laser beam discharge-excited by the oscillation stage laser device 100 around an optical axis on the basis of measurement results so as to eliminate a deviation between the section of the laser beam discharge-excited by the oscillation stage laser device 100 and a section of the laser beam discharge-excited by the amplification stage laser device 200.
申请公布号 JP2013165300(A) 申请公布日期 2013.08.22
申请号 JP20130110524 申请日期 2013.05.27
申请人 GIGAPHOTON INC 发明人 ARIGA TATSUYA
分类号 H01S3/10 主分类号 H01S3/10
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