发明名称 |
NONVOLATILE SEMICONDUCTOR STORAGE DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor storage device which has a wide memory window and a long data retention period.SOLUTION: A nonvolatile semiconductor storage device of an embodiment comprises: a semiconductor layer; a first insulation film formed on the semiconductor layer; a charge storage layer which is formed on the first insulation film and which has metal fine particles; a second insulation film formed on the charge storage layer; and a gate electrode formed on the second insulation film. A voltage is applied, in an operation of data writing, between the gate electrode and the semiconductor layer so as to cause the gate electrode to be relatively negative voltage and cause the charge storage layer to store positive charge. |
申请公布号 |
JP2013197269(A) |
申请公布日期 |
2013.09.30 |
申请号 |
JP20120062004 |
申请日期 |
2012.03.19 |
申请人 |
TOSHIBA CORP |
发明人 |
HATTORI SHIGEKI;YAMAGIWA MASAKAZU;TERAI KATSUYA;NISHIZAWA HIDEYUKI;ASAKAWA KOUJI;FUKUZUMI YOSHIAKI |
分类号 |
H01L21/336;H01L21/8247;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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