发明名称 COMPOSITION DE FONDANT ET PROCEDE DE BRASAGE
摘要 <p>An amine flux composition is provided, comprising, as an initial component: an amine fluxing agent represented by formula I: wherein R1, R2, R3 and R4 are independently selected from a hydrogen, a substituted C1-80 alkyl group, an unsubstituted C1-80 alkyl group, a substituted C7-80 arylalkyl group and an unsubstituted C7-80 arylalkyl group; wherein R7 and R8 are independently selected from a C1-20 alkyl group, a substituted C1-20 alkyl group, a C6-20 aryl group and a substituted C6-20 aryl group or wherein R7 and R8, together with the carbon to which they are attached, form a C3-20 cycloalkyl ring optionally substituted with a C1-6 alkyl group; wherein R10 and R11 are independently selected from a C1-20 alkyl group, a substituted C1-20 alkyl group, a C6-20 aryl group and a substituted C6-20 aryl group or wherein R10 and R11, together with the carbon to which they are attached, form a C3-20 cycloalkyl ring optionally substituted with a C1-6 alkyl group; and, wherein R9 is selected from a hydrogen, a C1-30 alkyl group, a substituted C1-30 alkyl group, a C6-30 aryl group and a substituted C6-30 aryl group. Also provided is a method of soldering an electrical contact using the amine flux composition.</p>
申请公布号 FR2968229(B1) 申请公布日期 2014.05.02
申请号 FR20110061088 申请日期 2011.12.02
申请人 ROHM AND HAAS ELECTRONIC MATERIALS LLC;ANGUS CHEMICAL COMPANY;DOW GLOBAL TECHNOLOGIES LLC 发明人 FLEMING DAVID D.;GALLAGHER MIKE K.;HO KIM SANG;LIU XIANG-QIAN;PEERA ASGHAR AKBER;ROBINSON GLEN;TOMLINSON IAN;WINKLE MARK R.
分类号 B23K35/363;C07C211/09;H05K3/32 主分类号 B23K35/363
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