发明名称 |
AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATE MATERIALS FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES |
摘要 |
An aqueous polishing composition comprising (A) abrasive particles which are positively charged when dispersed in an aqueous medium having a pH in the range of from 3 to 9 as evidenced by the electrophoretic mobility; (B) water-soluble and water-dispersible hydroxy group containing components selected from (b1) aliphatic and cycloaliphatic hydroxycarboxylic acids, wherein the molar ratio of hydroxy groups to carboxylic acid groups is at least 1; (b2) esters and lactones of the hydroxycarboxylic acids (b1) having at least one hydroxy group; and (b3) mixtures thereof; and (C) water-soluble and water-dispersible polymer components selected from (c1) linear and branched alkylene oxide polymers; (c2) linear and branched, aliphatic and cycloaliphatic poly(N-vinylamide) polymers; and (c3) cationic polymeric flocculents having a weight average molecular weight of less than 100,000 Dalton.; and a process for polishing substrate materials for electrical, mechanical and optical devices. |
申请公布号 |
EP2614123(A4) |
申请公布日期 |
2014.07.30 |
申请号 |
EP20110823142 |
申请日期 |
2011.09.06 |
申请人 |
BASF SE |
发明人 |
LI, YUZHUO;CHU, JEA-JU;VENKATARAMAN, SHYAM, SUNDAR;USMAN IBRAHIM, SHEIK, ANSAR;PINDER, HARVEY, WAYNE |
分类号 |
C09G1/02;C03C19/00;C09G1/04;C09G1/18;C09K3/14 |
主分类号 |
C09G1/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|