| 摘要 |
A composition for forming an antistatic film, includes: an oligomer compound of Formula (1A):;;(where R1 is a hydrogen atom or a group of Formula (2), each of R2 and R3 is independently a hydrogen atom, a group of Formula (3), or a group of Formula (4), at least one of the plurality of Rs is a sulfo group, a and b are positive integers satisfying 2≦(a+b)≦6; and each of a plurality of xs is independently an integer from 0 to 4):;;(where n is an integer satisfying 1≦n<(a+b+4); a, b, a plurality of Rs, and x are the same as those in Formula (1A); and each of a plurality of ys is independently an integer from 0 to 5); and water. |
| 主权项 |
1. A composition for forming an antistatic film, comprising:
an oligomer compound of Formula (1A):(where R1 is a hydrogen atom or a group of Formula (2); each of R2 and R3 is independently a hydrogen atom, a group of Formula (3), or a group of Formula (4); each of a plurality of Rs is independently a halogen atom, a hydroxy group, an amino group, a silanol group, a thiol group, a carboxy group, a carbamoyl group, a phosphoric acid group, a phosphoester group, an ester group, a thioester group, an amido group, a nitro group, a C1-20 primary hydrocarbon group, secondary hydrocarbon group, or tertiary hydrocarbon group, a C1-20 organoxy group, a C1-20 organoamino group, a C1-20 organosilyl group, a C1-20 organothio group, an acyl group, or a sulfo group, and at least one of the plurality of Rs is a sulfo group; a and b are positive integers satisfying 2≦(a+b)≦6; and each of a plurality of xs is independently an integer from 0 to 4):(where n is an integer satisfying 1≦n<(a+b+4); a, b, a plurality of Rs, and x are the same as those in Formula (1A); and each of a plurality of ys is independently an integer from 0 to 5); and
water. |
