| 发明名称 |
SURFACE PASSIVATION OF SUBSTRATE BY MECHANICALLY DAMAGING SURFACE LAYER |
| 摘要 |
An apparatus comprises a substrate having a trap rich surface layer produced by mechanically grinding a surface of the substrate, an electrical contact disposed on the trap rich surface layer of the substrate, and an electronic device electrically connected to the electrical contact. |
| 申请公布号 |
US2015014795(A1) |
申请公布日期 |
2015.01.15 |
| 申请号 |
US201313938742 |
申请日期 |
2013.07.10 |
| 申请人 |
Avago Technologies General IP (Singapore) Pte. Ltd. |
发明人 |
FRANOSCH Martin;BARFKNECHT Andrew Thomas |
| 分类号 |
H03H9/17;H01L21/768;H01L21/67;H01L21/304 |
主分类号 |
H03H9/17 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus, comprising:
a substrate having a trap rich surface layer produced by mechanically grinding a surface of the substrate; an electrical contact disposed on the trap rich surface layer of the substrate; and an electronic device electrically connected to the electrical contact. |
| 地址 |
Singapore SG |
