发明名称 METHOD FOR ISOLATING FLEXIBLE FILM FROM SUPPORT SUBSTRATE
摘要 Method for isolating a flexible film from a support substrate and method for fabricating an electronic device are provided. The method for isolating a flexible film from a support substrate includes providing a substrate with a top surface. A surface treatment is subjected to the top surface of the substrate, forming a top surface with detachment characteristics. A flexible film is formed on the top surface with detachment characteristics. The flexible film within the top surface with detachment characteristics is cut and isolated.
申请公布号 US2015027642(A1) 申请公布日期 2015.01.29
申请号 US201414509837 申请日期 2014.10.08
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 CHEN Dong-Sen;WEI Hsiao-Fen;JIANG Liang-You;CHANG Yu-Yang
分类号 B32B43/00 主分类号 B32B43/00
代理机构 代理人
主权项 1. A method for isolating a flexible film from a support substrate, comprising: providing a support substrate with a top surface; subjecting the top surface of the support substrate with a surface treatment, thereby forming a top surface with detachment characteristics; forming a flexible film on the top surface of the support substrate; and isolating the flexible film from the support substrate, wherein the surface treatment comprises providing a chemical agent to react with the top surface of the support substrate; and wherein the chemical agent has the structure represented bywherein W is C, Si, or Ge; X is S, or Se; Y is C, or S; R1, R2, and R3 are independent and comprise H, alkenyl group, alkyl group, or —OR; R is C1-18 alkyl group; R4 is F, Br, I, carboxyl group, amino group, amine group, cyano group, amide group, alkyl halide group, or combinations thereof; R5 is Li; and R6, R7, and R8 are independent and comprise F, Cl, Br, I, alkenyl group, alkyl group, carboxyl group, amino group, amine group, cyano group, amide group, alkyl halide group, or combinations thereof.
地址 Hsinchu TW