| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a resin composition for forming a fine pattern capable of easily manufacturing a fine pattern having excellent line edge roughness with high mass-productivity, and to provide a method for forming a fine pattern. <P>SOLUTION: There is provided a resin composition comprising a silicon-containing polymer selected from the group consisting of polysilazane or polysilsesquioxane, a silicon-free organic polymer such as polystyrene and a solvent capable of dissolving them. There is also provided a method for forming a fine pattern according to the present invention comprising the steps of: forming a first protruding pattern on a film to be processed; forming a spacer formed from the resin composition at a sidewall of a protruding part of the protruding pattern; and forming a fine pattern by using the spacer or a resin layer disposed around the spacer as a mask. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
