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发明名称
METHOD FOR FORMING AMORPHOUS SILICON LAYER AND METHOD FOR FABRICATING LIQUID CRYSTAL DISPLAY USING THE SAME
摘要
<p>기판을 제공하고 상기 기판 상에 화학적 기상 증착 장치를 이용하여 저온에서 성막한 Si-H 결합이 Si-H결합의 4배 이하인 비정질 실리콘층을 형성하는 방법이 제공된다.</p>
申请公布号
KR101507967(B1)
申请公布日期
2015.04.03
申请号
KR20080093370
申请日期
2008.09.23
申请人
发明人
分类号
G02F1/136;H01L29/786
主分类号
G02F1/136
代理机构
代理人
主权项
地址
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