| 摘要 |
<p>PROBLEM TO BE SOLVED: To efficiently prevent microwaves from being leaked from inside of a plasma processing apparatus without degrading adiathermancy between the plasma processing apparatus and a transport chamber.SOLUTION: The plasma processing apparatus includes: a processing container having an aperture for carrying in/out an object to be processed from/to an adjacent chamber; a microwave introduction mechanism for introducing a microwave into the processing container; an exhauster for evacuating the processing container; and an adiabatic member disposed between an outer surface of a gate valve arranged in the vicinity of the aperture and the chamber adjacent to the processing container. In the adiabatic member, a conductive coat is applied at least on an opposing surface of the adiabatic member to the outer surface of the gate valve, an opposing surface of the adiabatic member to the chamber adjacent to the processing container, and a surface of the adiabatic member exposed to outer air.</p> |
