发明名称 METHOD AND DEVICE OF EVALUATING DEFECT OF SEMICONDUCTOR CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method of rapidly, nondestructively and accurately evaluating a two-dimensional distribution of crystalline structure defects of a semiconductor sample consisting of a wide gap semiconductor. SOLUTION: The method of evaluating a two-dimensional distribution of crystalline structure defects of a semiconductor sample includes processes of: emitting photoluminescence light from the semiconductor sample by irradiating the semiconductor sample with light; and obtaining a two-dimensional distribution of the crystalline structure defects of the semiconductor sample by observing the emitted photoluminescence light. In the method, a semiconductor constituting the semiconductor sample is a wide gap semiconductor, and light for irradiating the semiconductor sample therewith has energy smaller than energy corresponding to a band gap of the wide gap semiconductor. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009054771(A) 申请公布日期 2009.03.12
申请号 JP20070219745 申请日期 2007.08.27
申请人 JAPAN AEROSPACE EXPLORATION AGENCY 发明人 TAJIMA MICHIO
分类号 H01L21/66;G01N21/00;G01N21/64 主分类号 H01L21/66
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