被洗浄基板、あるいは、さらに処理される清潔な基板を製造するための、方法および装置

摘要

PROBLEM TO BE SOLVED: To provide a method of and an apparatus for producing a substrate to be cleaned or a clean substrate to be further treated.SOLUTION: The plasma etch cleaning of a substrate is carried out by using a plasma discharge device provided with an electron source cathode (5) and an anode device (7). The anode device (7) comprises an anode electrode (9) at one side and a locked-in part (11) isolated electrically from itself at the other side. The locked-in part (11) has an opening (13) headed for the area (S) of the substrate (21) to be cleaned. The supply circuit having an electricity supply source (19) supplies electricity to the electron source cathode (5) and the anode electrode (9). The circuit is operated floating electrically.