| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a Fe-Co-Ta sputtering target material for forming a soft magnetic film used in a magnetic recording medium, etc., which is capable of suppressing particle formation during sputtering as much as possible. <P>SOLUTION: A method for manufacturing the Fe-Co-Ta sputtering target material comprises: a step of mixing a Fe-Ta powder, a Co-Ta powder and a pure Ta powder to obtain a mixed powder; and a step of performing pressure sintering of the mixed powder at a sintering temperature of 1,100-1,400°C under a pressure of 125-200 MPa for 1-10 h. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
