发明名称 SEMICONDUCTOR APPEARANCE INSPECTION DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To solve the problem in which in conjunction with fineness of a wafer of an inspection object, measures have to be taken by increasing the number of processor elements, and the semiconductor appearance inspection device which has to attain low costs by holding down non-inspection areas from image data to reduce position deviation processing loads of the processor elements and suppressing increase in image processing hardware quantity can be a high-costed device.SOLUTION: A semiconductor appearance inspection device 99 has: an image detection unit 8 that detects image data 12 on a wafer 2 from a sensor 5; an amount-of-characteristic calculation unit 13 that calculates an amount of characteristic of the detected image data 12; an image data cut-out unit 17 that sets an inspection area of the image data 12 on the basis of the calculated amount of characteristic; a transmission control unit 19 that transmits transmission data 23 including the set inspection area of the image data 12; and a processor element that uses the transmitted transmission data 23 to perform defect determination processing of the wafer 2.</p>
申请公布号 JP2015169452(A) 申请公布日期 2015.09.28
申请号 JP20140042271 申请日期 2014.03.05
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SAKURAI YUICHI;HIRANO KATSUNORI;YAMASHITA HIROYUKI;IIZUMI KEN;TAKESAWA MASAYUKI
分类号 G01N21/956;G01B11/00;G01B11/30;G01N21/88;H01L21/66 主分类号 G01N21/956
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